发明名称 PATTERN INSPECTION METHOD AND ITS DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To perform pattern inspection of a glass substrate after removing a dead zone of the pattern inspection on both ends of the glass substrate. <P>SOLUTION: This method has: the first step for generating the first image data (right-shifted image data ImgA) determined by shifting in one direction as much as the prescribed number of pixels, original image data (ImgO) acquired by imaging a regular pattern to be inspected; the second step for generating the second image data (left-shifted image data ImgB) determined by shifting the original image data (ImgO) in the opposite direction to one direction as much as the prescribed number of pixels; and the third step for comparing the first image data with the second image data respectively with respect to the original image data (ImgO), and acquiring an inspection result of the pattern to be inspected from the comparison result. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005069721(A) 申请公布日期 2005.03.17
申请号 JP20030209300 申请日期 2003.08.28
申请人 OLYMPUS CORP 发明人 ONISHI TAKAAKI
分类号 G01B11/24;G02F1/13;G06T1/00;H01L21/66 主分类号 G01B11/24
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