| 摘要 |
<p>A wave front aberration measuring device, wherein laser beam sources (1-1, 1-2) outputting laser beams with wavelengths of (lambda1, lambdai) are installed in a lighting system (1), and either of the laser beam sources (1-1, 1-2) is selected according to the wavelengths (lambda1, lambdai) of an inspected optical system (8) analyzing wave front aberration. In a wave front aberration analyzing device (2), the wave front aberration of the inspected optical system (8) is analyzed based on the wavelengths (lambda1, lambdai) of the laser beam selected by the lighting system (1) and interference fringe image data.</p> |
