发明名称 INTERFEROMETER, STAGE APPARATUS, AND EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an interferometer etc. capable of achieving compactness and lightness in weight and suppressing the occurrence of measurement errors as much as possible. SOLUTION: The interferometer 10 includes a laser light source 11; a light dividing member 12; a 1/4-wavelength plate 13; a movable mirror 14; and a detector 15. The laser light source 11 emits measuring light (a continuous line) and reference light (a dashed line) having different polarizing directions. The light dividing member 12 receives the measuring light and the reference light from the laser light source 11, directs the measuring light to the movable mirror 14 via the 1/4 wavelength plate 13, directs the reference light to the detector 15, and directs the measuring light reflected at the movable mirror 14 to the detector 15 via the 1/4 wavelength plate 13. An optical path of the reference light is set in such a way that its overall path may be contained in an optical path of the measuring light. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005069686(A) 申请公布日期 2005.03.17
申请号 JP20030208225 申请日期 2003.08.21
申请人 NIKON CORP 发明人 HIDAKA YASUHIRO
分类号 G01B9/02;G03F9/00;H01L21/027;H01L21/68;(IPC1-7):G01B9/02 主分类号 G01B9/02
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