| 摘要 |
An apparatus for cleaning a substrate surface is provided to reduce tact time required for removing foreign material on the substrate surface and obtain smaller foot prints. An apparatus for cleaning a substrate surface includes a substrate-supportable moving unit(20) and a cleaning unit(10). The substrate-supportable moving unit supports a substrate(50) and moves a substrate in a first direction. The cleaning unit includes a cleaning belt(11). The cleaning belt repeatedly slides on the substrate surface in a second direction crossing the first direction, and removes foreign material on the substrate surface, while the substrate moves in the first direction. |
