发明名称 |
Clamshell and small volume chamber with fixed substrate support |
摘要 |
Embodiments of the present invention generally relate to a clamshell and small volume chamber with a fixed substrate support. One embodiment of a processing chamber includes a fixed substrate support having a substrate receiving surface, a pumping ring disposed around a perimeter of the substrate receiving surface, and a gas distribution assembly disposed over the fixed substrate support. The pumping ring forms at least a portion of a pumping channel and has one or more apertures formed therethrough. The chamber may further include a gas-flow diffuser disposed radially inward of the apertures of the pumping ring. Another embodiment of a processing chamber includes a first assembly comprising a fixed substrate support and a second assembly comprising a gas distribution assembly. The first assembly includes a first assembly body that is shaped and sized so that at least a portion of the first assembly body is below the substrate receiving surface of the substrate support. A hinge assembly couples the first assembly and the second assembly. The first assembly and the second assembly can be selectively positioned between an open position and a closed position.
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申请公布号 |
US6866746(B2) |
申请公布日期 |
2005.03.15 |
申请号 |
US20020302774 |
申请日期 |
2002.11.21 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
LEI LAWRENCE C.;MAK ALFRED W.;TZU GWO-CHUAN;TEPMAN AVI;XI MING;GLENN WALTER BENJAMIN |
分类号 |
C23C16/44;C23C16/455;H01L21/00;(IPC1-7):C23C16/00;C23F1/00;H01L21/306 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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