发明名称 Method of making a microelectronic assembly
摘要 A method of making a microelectronic assembly includes providing a dielectric layer including a first major face having a first adhesive, a second major face having a second adhesive, and a protective liner over the second adhesive, juxtaposing a plurality of microelectronic elements with the first major face of dielectric layer, and assembling the microelectronic elements with the dielectric layer by abutting the microelectronic elements against the first adhesive of the dielectric layer. The method also includes at least partially severing the dielectric layer while maintaining the protective liner as a single piece of material so as to form a plurality of individual microelectronic units overlying the protective liner, whereby each of the individual microelectronic units includes at least one of the microelectronic elements attached to an at least partially severed portion of the dielectric layer.
申请公布号 US6867065(B2) 申请公布日期 2005.03.15
申请号 US20030614069 申请日期 2003.07.03
申请人 TESSERA, INC. 发明人 BEROZ MASUD
分类号 H01L21/301;H01L21/44;H01L21/48;H01L21/50;H01L21/58;H01L21/68;H01L21/8238;(IPC1-7):H01L21/44 主分类号 H01L21/301
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