发明名称 Multi-exposure drawing method and apparatus thereof
摘要 In a drawing method, all information on a pattern to be drawn on a drawing surface, represented by first vector-graphic data of a drawing-coordinate-system, is transmitted to an exposure drawing apparatus having a plurality of optical modulation elements. The first vector-graphic data is converted to second vector-graphic data of an exposing-coordinate-system that conforms to the exposure drawing apparatus, and the second vector-graphic data is converted to raster-graphic data of the exposing-coordinate-system. Finally, the drawing surface is multi-exposed for drawing the pattern, based on the raster-graphic data to control the exposure by the optical modulation elements.
申请公布号 US2005052464(A1) 申请公布日期 2005.03.10
申请号 US20040933307 申请日期 2004.09.03
申请人 PENTAX INDUSTRIAL INSTRUMENTS CO., LTD. 发明人 OKUYAMA TAKASHI
分类号 G03F7/20;G06T11/20;H01L21/027;H05K3/00;(IPC1-7):G06T11/20 主分类号 G03F7/20
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