| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a resin for photoresist extremely readily soluble in a solvent for photoresist. <P>SOLUTION: The resin for photoresist is obtained by the following process: A monomer mixture essentially comprising a monomer(a) containing a group which is made soluble to an alkali through an eliminable part thereof by an acid and a monomer (b) containing a polar group-bearing alicyclic skeleton is subjected to polymerization under reduced pressure and reflux by drip polymerization method. This resin is composed essentially of recurring units corresponding to the monomer (a) and recurring units corresponding to the monomer (b). In the above process, the polymerization temperature is normally 50-150°C and the pressure in the dripping is preferably about 10-600 mmHg(1.33-79.8 kPa). <P>COPYRIGHT: (C)2005,JPO&NCIPI |
