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经营范围
发明名称
Ruthenium Thin Film Formation Method
摘要
申请公布号
KR100475402(B1)
申请公布日期
2005.03.10
申请号
KR20020031577
申请日期
2002.06.05
申请人
发明人
分类号
H01L21/20;(IPC1-7):H01L21/20
主分类号
H01L21/20
代理机构
代理人
主权项
地址
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