| 摘要 |
PROBLEM TO BE SOLVED: To effectively remove a solvent in a dyestuff film without degrading the tilt of an optical disk substrate. SOLUTION: A thermal treatment apparatus of an optical disk substrate which removes the solvent from the dyestuff film by heat treating the optical disk substrate formed with the dyestuff film containing the solvent includes a substrate cradle which holds the optical disk substrate, an electromagnetic wave irradiation device which heats the optical disk substrate by irradiating the substrate with electromagnetic waves, and a rotary driving unit which rotates the optical disk substrate at a high speed by rotating the substrate cradle at a high speed while the optical disk substrate is irradiated with the electromagnetic waves. COPYRIGHT: (C)2005,JPO&NCIPI
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