发明名称 CONTAINER FOR PRETREATMENT OF ELEMENTAL ANALYSIS, METHOD FOR ELEMENTAL ANALYSIS, INDUCTIVELY-COUPLED PLASMA TORCH AND ELEMENTAL ANALYSIS SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a highly pure container for pretreatments of elemental analyses, which is used for the pretreatments of the elemental analyses and has superior heat resistance and chemical resistance such as acid resistance or the like; to provide an inductively-coupled plasma torch with superior durability which is of inductively-coupled plasma torches used for an analysis system adopting an ICP method and makes it possible to carry out precise elemental analyses; and to provide an elemental analysis system which has the plasma torch and uses the ICP method. SOLUTION: The container for the pretreatments of the elemental analyses, which is used for the pretreatments of the elemental analyses, is a ceramic container manufactured by a chemical vapor deposition (CVD) method. Furthermore, the inductively-coupled plasma torch which is used for the elemental analysis system adopting the ICP method, is provided with at least an induction coil and a nozzle, and the nozzle is a ceramic nozzle manufactured by the CVD method. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005061880(A) 申请公布日期 2005.03.10
申请号 JP20030207994 申请日期 2003.08.20
申请人 SHIN ETSU CHEM CO LTD 发明人 KIMURA NOBORU;KUNIYA JOJI;ARAI MASAKI
分类号 G01N21/73;B01L3/00;B01L3/04;C23C16/34;C23C16/38;C23C16/42;G01N1/10;G01N1/28;G01N1/38;G01N21/31;H01J49/10;H05H1/30;(IPC1-7):G01N1/10 主分类号 G01N21/73
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