发明名称 SUBSTRATE PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing device which allows the miniaturization of a device to be obtained by making a rotator lighter. SOLUTION: The supply of gases to a fluid motor 31 allows shock/reactionary action to be given to a turbine blade 34 and the torque to be given to a rotar 33, so that a substrate W is rotated. Therefore, it is preferable that the torque by gases is given to the rotator 33, and the rotator 33 with only turbine blades 34 disposed on its whole circumference can be used, free from requiring a ferromagnetic material such as a permanent magnet. Consequently, the rotator 33 is made to be lighter and the miniaturization of the substrate processing device is attained by using the fluid motor 31. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005064531(A) 申请公布日期 2005.03.10
申请号 JP20040299054 申请日期 2004.10.13
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SAKAI TAKAMASA;HIRAE SADAO
分类号 H01L21/027;H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/027
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