发明名称 |
TARGETS WITH HIGH PASS-THROUGH-FLUX FOR MAGNETIC MATERIAL SPUTTERING, METHOD OF MANUFACTURE AND HARD DISK OBTAINABLE THEREOF |
摘要 |
<p>A target for a deposition apparatus is formed by blending at least two different types of powders together and consolidating the powders with a powder metallurgy process to form a billet. The target is then formed from the billet. The target includes a first material phase having a first PTF and a second material phase having a second PTF higher than the first PTF. The second PTF is also higher than a PTF of a material having the same chemistry as the target.</p> |
申请公布号 |
EP1511878(A2) |
申请公布日期 |
2005.03.09 |
申请号 |
EP20030757262 |
申请日期 |
2003.05.14 |
申请人 |
HERAEUS, INC. |
发明人 |
ZHANG, WENJUN;KUNKEL, BERND;DEODUTT, ANAND;BARTHOLOMEUCZ, MICHAEL |
分类号 |
B22F1/00;C23C14/34;G11B5/851;(IPC1-7):C23C14/34;G11B5/64;H01J37/34;G11B5/84;C23C14/35 |
主分类号 |
B22F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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