发明名称 NOTCH ALIGNER OF WAFER AND ALIGN METHOD TO PREVENT DAMAGED WAFER FROM DAMAGING ANOTHER WAFER OR CONTAMINATING EQUIPMENT
摘要 PURPOSE: A notch aligner of a wafer is provided to prevent a damaged wafer from damaging another wafer or contaminating equipment by detecting a defect like a groove or hole formed by an edge portion of a wafer damaged in aligning a notch of the wafer. CONSTITUTION: A frame(110) is prepared. A rotation roller(120) is rotatively installed in the frame to rotate a plurality of wafers whose edge is inserted into a plurality of the first support grooves(121). An align bar(130) aligns a plurality of wafer notches, installed in the frame to be parallel with the rotation roller. A plurality of wafer edge portions are supported by a plurality of the second support grooves(141) of a support member(140). A wafer elevating plate(170) increases the plurality of wafers whose notches are caught on an align bar to rotate the wafers and closely adheres the wafer to the rotation roller, rotatively installed in the upper end of the align bar. A light emitting device(151) and a light receiving device(152) are formed at both sides of the edge of each wafer, confronting each other. A plurality of notch-and-damage detecting parts(150) output a detection signal with respect to the notch and a damaged part of the wafer rotating for re-alignment. A control part receives the detection signal outputted from each notch-and-damage detecting part and determines that the wafer with at least two detection signals is damaged. A display part displays the damage of the wafer to the outside, controlled by the control part.
申请公布号 KR20050022445(A) 申请公布日期 2005.03.08
申请号 KR20030060646 申请日期 2003.08.30
申请人 DONGBUANAM SEMICONDUCTOR INC. 发明人 CHO, IN BAE;LEE, CHEA GAB
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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