| 摘要 |
PURPOSE: A developer supply apparatus is provided to avoid a development defect of a wafer and improve an operation rate of an apparatus by preventing developer from being loaded by a pressure difference of a nozzle. CONSTITUTION: A wafer is absorbed by a spin chuck and rotated in a catch cup of a developer. In the developer that injects a developer solution twice through an e3 nozzle(3) and a PDD(post develop dispense) nozzle(5) to develop the wafer, a developer supply apparatus supplies a developer solution to the e3 nozzle and the PDD nozzle through a supply pipe(25a,25b) from a buffer tank(20). The supply pipe to the e3 nozzle and the supply pipe to the PDD nozzle are composed of separate lines from the buffer tank. An on-off valve(26a) and a suck-back valve are formed as one body in the supply pipe to the PDD nozzle, controlling the flow of a developer solution and sucking the developer solution from the end of the nozzle.
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