发明名称 |
Sputter deposition of lithium phosphorous oxynitride material |
摘要 |
A method of depositing lithium phosphorus oxynitride on a substrate, the method comprising loading a substrate into a vacuum chamber having a target comprising lithium phosphate, introducing a process gas comprising nitrogen into the chamber and maintaining the gas at a pressure of less than about 15 mTorr; and forming a plasma of the process gas in the chamber to deposit lithium phosphorous oxynitride on the substrate.
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申请公布号 |
US6863699(B1) |
申请公布日期 |
2005.03.08 |
申请号 |
US20000705962 |
申请日期 |
2000.11.03 |
申请人 |
FRONT EDGE TECHNOLOGY, INC. |
发明人 |
KRASNOV VICTOR;NIEH KAI-WEI;TING SU-JEN;TANG PAUL;CHANG FAN-HSIU;LIN CHUN-TING |
分类号 |
C23C14/06;H01M6/18;H01M10/36;(IPC1-7):C23C14/00;C23C14/32;H01M6/00 |
主分类号 |
C23C14/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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