| 发明名称 |
MODEL AND PARAMETER SELECTION FOR OPTICAL METROLOGY |
| 摘要 |
<p>A profile model for use in optical metrology of structures in a wafer is selected, the profile model having a set of geometric parameters associated with the dimensions of the structure. The set of geometric parameters is selected to a set of optimization parameters. The number of optimization parameters within the set of optimization parameters is less than the number of geometric parameters within the set of geometric parameters. A set of selected optimization parameters is selected from the set of optimization parameters. The parameters of the set of selected geometric parameters are used as parameters of the selected profile model. The selected profile model is tested against one or more termination criteria.</p> |
| 申请公布号 |
KR20050021549(A) |
申请公布日期 |
2005.03.07 |
| 申请号 |
KR20057001156 |
申请日期 |
2003.07.25 |
| 申请人 |
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发明人 |
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| 分类号 |
G01B11/06;G01B11/14;G01B11/00;G01B11/02;G01B11/04;G01B11/08;G01B11/22;G01B11/28;G01N21/00;G01N21/41;G06F;G06F15/00;G06F19/00;H01L21/66;(IPC1-7):G01B11/14 |
主分类号 |
G01B11/06 |
| 代理机构 |
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代理人 |
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