发明名称 TRANSPARENT THIN FILM ELECTRODE FOR FORMING OHMIC CONTACT OF P-TYPE SEMICONDUCTOR INCLUDING GALLIUM FOR EMBODYING HIGH-QUALITY LED AND LASER DIODE TO IMPROVE YIELD OF DEVICE
摘要 PURPOSE: A transparent thin film electrode for forming an ohmic contact of a p-type semiconductor including gallium for embodying a high-quality LED(light emitting diode) and a laser diode is provided to improve yield of a device by making a p-type semiconductor have a good surface state when an ohmic contact is formed on the surface of the p-type semiconductor. CONSTITUTION: A transparent thin film electrode for a p-type semiconductor LED including a laser diode has at least nitrogen and gallium. The transparent thin film electrode includes a copper-based alloy(including a solid solution) layer and a metal capping layer formed on the alloy layer.
申请公布号 KR20050020513(A) 申请公布日期 2005.03.04
申请号 KR20030058529 申请日期 2003.08.23
申请人 GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY;SAMSUNG ELECTRONICS CO., LTD. 发明人 LEEM, DONG SUK;SEONG, TAE YEON;SONG, JUNE O
分类号 H01J1/62;H01L33/32;H01L33/42;(IPC1-7):H01L33/00 主分类号 H01J1/62
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