| 发明名称 |
Treating surface of components with low pressure plasma comprises using vacuum chamber having opening which is closed before evacuation, introduction and ionization of process gas |
| 摘要 |
<p>Treating the surface of components with a low pressure plasma comprises using a vacuum chamber (1) having an opening (13) which is closed before evacuation, introduction and ionization of a process gas using a part of the surface of the component to be treated.</p> |
| 申请公布号 |
DE10332921(A1) |
申请公布日期 |
2005.03.03 |
| 申请号 |
DE2003132921 |
申请日期 |
2003.07.19 |
| 申请人 |
EISENLOHR, JOERG |
发明人 |
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| 分类号 |
B01J3/00;B01J3/03;B01J19/08;C23C16/04;C23C16/54;H01J37/32;H01L21/00;(IPC1-7):C23C16/50;C23C16/02;C23C14/02;B05D3/00 |
主分类号 |
B01J3/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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