发明名称 |
REACTION CHAMBER, HIGH-TEMPERATURE TRAP, AND TREATMENT DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a reaction chamber capable of maintaining the reaction rate of a work when a high-temperature trap is disposed in the reaction chamber. SOLUTION: A counterflow preventive device to separate a treatment space with a work disposed therein from a trap space with a high-temperature trap disposed therein is provided in a reaction chamber. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005054221(A) |
申请公布日期 |
2005.03.03 |
申请号 |
JP20030284873 |
申请日期 |
2003.08.01 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
KUBO KENICHI;BUZAN BANSON;IKEDA KYOKO;YOSHIKAWA HIDEKI |
分类号 |
C23C16/44;C23C16/455;(IPC1-7):C23C16/44 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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