发明名称 REACTION CHAMBER, HIGH-TEMPERATURE TRAP, AND TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a reaction chamber capable of maintaining the reaction rate of a work when a high-temperature trap is disposed in the reaction chamber. SOLUTION: A counterflow preventive device to separate a treatment space with a work disposed therein from a trap space with a high-temperature trap disposed therein is provided in a reaction chamber. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005054221(A) 申请公布日期 2005.03.03
申请号 JP20030284873 申请日期 2003.08.01
申请人 TOKYO ELECTRON LTD 发明人 KUBO KENICHI;BUZAN BANSON;IKEDA KYOKO;YOSHIKAWA HIDEKI
分类号 C23C16/44;C23C16/455;(IPC1-7):C23C16/44 主分类号 C23C16/44
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