| 摘要 |
PROBLEM TO BE SOLVED: To contribute to the stable operation of a semiconductor manufacturing line and the quality improvement of its products, by suppressing metal corrosion caused by the transmitting atmosphere of chemicals having high metal corrosiveness, and by suppressing the failure of equipment caused by the corrosion, and further, by protecting the products from pollution caused by metal impurities. SOLUTION: The inside of a chemical unit comprises a double-acting-operation metal-free slow-purge valve-unit, double-acting-operation metal-free valves, FRP fluorine-resin-lining tanks, fluorine-resin tubes, PEEK-material bolts, and a control unit using atmospherically cut-off metal components. COPYRIGHT: (C)2005,JPO&NCIPI
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