发明名称 Electrode structure for electronic and opto-electronic devices
摘要 The present invention discloses an electrode structure for electronic and opto-electronic devices. Such a device comprises a first electrode substantially having a conductive layer (204), a nonmetal layer (206) formed on the conductive layer, a fluorocarbon layer (208) formed on the nonmetal layer, a structure (210) formed on the structure. The electrode may further comprise a buffer layer (205) between the conductive layer and the nonmetal layer.
申请公布号 US2005045873(A1) 申请公布日期 2005.03.03
申请号 US20040499538 申请日期 2004.06.21
申请人 ALVARADO SANTOS F.;BEIERLEIN TILMAN A.;CORNE BRIAN K.;DRECHSLER UTE;GERMANN ROLAND;KARG SIEGFRIED F.;MUELLER PETER;RIEL IIEIKE;RIESS WALTER;RUHSTALLER BEAT;SEIDLER PAUL;WIDMER ROLAND 发明人 ALVARADO SANTOS F.;BEIERLEIN TILMAN A.;CORNE BRIAN K.;DRECHSLER UTE;GERMANN ROLAND;KARG SIEGFRIED F.;MUELLER PETER;RIEL IIEIKE;RIESS WALTER;RUHSTALLER BEAT;SEIDLER PAUL;WIDMER ROLAND
分类号 H01L51/50;H01L51/52;H05B33/10;H05B33/22;(IPC1-7):H01L35/24 主分类号 H01L51/50
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