DEVICE FOR COATING A STATIONARY SUBSTRATE BY PULSE MAGNETRON SPUTTERING

摘要

The invention relates to a pulse magnetron sputtering device containing: a recipient (1) with a vacuum generating system; two magnetron sputtering sources (7, 8); at least one substrate holder (15), and; a power supply device. Said recipient, in one sectional plane, comprises a pentagonal cross-section that has at least one right angle. A magnetron sputtering source is mounted on each of the lateral walls (2, 3) that are situated at right angles to one another. The three remaining lateral walls (4-6) are each provided with an opening and associated flanges (16-18). At least one opening of one lateral wall located opposite a magnetron source is sealed via vacuum flanges comprising means for freely positioning the substrate holder either directly opposite the middle (20) of the opposing magnetron sputtering source or parallelly offset with regard to the middle of the source, and the power supply device is equipped with means for the magnetron sputtering sources. These means permit the supply of unipolar power pulses having a frequency ranging from 1 to 100 kHz in each source with a separately settable power and with a separately settable pulse ratio or permit the supply of bipolar power pulses having a frequency ranging from 1 to 100 kHz with, for each polarity, separately settable power and separately settable pulse ratio.