| 发明名称 |
EXPOSURE MASK, OPTICAL PROXIMITY CORRECTION APPARATUS, OPTICAL PROXIMITY CORRECTION METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND OPTICAL PROXIMITY CORRECTION PROGRAM |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To create layout pattern data while considering the quantity of drawing data. <P>SOLUTION: When GDS data is converted into EB data, whether the data quantity is equal to or less than a specified value is judged based on a discriminant. The GDS data is repeatedly created by changing parameters such as the template size and the dissection rule until the discriminant is satisfied. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
| 申请公布号 |
JP2005055465(A) |
申请公布日期 |
2005.03.03 |
| 申请号 |
JP20030205400 |
申请日期 |
2003.08.01 |
| 申请人 |
SEIKO EPSON CORP |
发明人 |
AKIYAMA HISASHI |
| 分类号 |
G03F1/36;G03F1/68;G03F1/70;H01L21/027;(IPC1-7):G03F1/08 |
主分类号 |
G03F1/36 |
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