发明名称 Plating path and method for depositing a metal layer on a substrate
摘要 A metal plating bath containing organic compounds that inhibit or retard the consumption of plating bath additives. The additives are chemical compounds that improve the brightness of the plated metal, the physical properties of the plated metal especially with respect to ductility and the micro-throwing power as well as the macro-throwing power of the plating bath. The organic compounds that inhibit or retard the consumption of additives increases the life of the plating bath and improves the efficiency of the plating process. The plating baths containing the organic compounds that inhibit or retard additive consumption can be employed to plate copper, gold, silver, palladium, platinum, cobalt, cadmium, chromium, bismuth, indium, rhodium, ruthenium, and iridium.
申请公布号 EP1300488(A3) 申请公布日期 2005.03.02
申请号 EP20010308486 申请日期 2001.10.04
申请人 SHIPLEY CO. L.L.C. 发明人 COBLEY, ANDREW J.;KAPECKAS, MARK J.;REDDINGTON, ERIK;SONNENBERG, WADE;BUCKLEY, THOMAS;BARSTAD, LEON R
分类号 C25D3/00;C25D3/02;C25D3/38;C25D17/10;H05K3/24 主分类号 C25D3/00
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