| 摘要 |
A method of fabricating a mask which can endure use for a long time and can be used for forming an isolated pattern with a high aspect ratio. The method includes the steps of: forming a soft material layer by disposing a soft material havingpositivephotosensitivityandadhesionoradhesiveness on a material as a target of machining; forming a hard material layer by disposing an opaque hard material in which a desired mask pattern has been formed in advance on the soft material layer; and forming the mask pattern in the soft material layer by performing exposure to light and development on the soft material layer by using the hard material layer as a photomask. |
