发明名称 Method for manufacturing gallium nitride compound semiconductor and light emitting element
摘要 A method for manufacturing a GaN compound semiconductor which can improve light emitting efficiency even when dislocations are present. An n type AlGaN layer, a undoped AlGaN layer, and a p type AlGaN layer are laminated on a substrate to obtain a double hetero structure. When the undoped AlGaN layer is formed, droplets of Ga or Al are formed on the n type AlGaN layer. The compositional ratio of Ga and Al in the undoped AlGaN layer varies due to the presence of the droplets, creating a spatial fluctuation in the band gap. Because of the spatial fluctuation in the band gap, the percentage of luminous recombinations of electrons and holes is increased.
申请公布号 US6861270(B2) 申请公布日期 2005.03.01
申请号 US20020092231 申请日期 2002.03.06
申请人 SAKAI SHIRO;NITRIDE SEMICONDUCTORS CO., LTD. 发明人 SAKAI SHIRO
分类号 C30B29/38;H01L21/205;H01L33/06;H01L33/32;H01L33/34;H01S5/323;H01S5/343;(IPC1-7):H01L27/15;H01L31/12 主分类号 C30B29/38
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