发明名称 X-RAY DIFFRACTION MEASURING CONTAINER FOR THIN-FILM SAMPLE
摘要 PROBLEM TO BE SOLVED: To provide an X-ray diffraction measurement container for a thin-film sample which is small and easy to handle, controls the environments within the container through the introduction and discharge of gas using external means, and maintains the environments, wherein light irradiation and light transmission are allowed in the vertical direction, with respect to the surface of the thin film sample for structural changes and analysis of the sample. SOLUTION: The X-ray diffraction measurement container (1) for a thin film comprises a container holding section (2) which installs a container body on a ready-made, general-purpose X-ray diffraction measuring apparatus; a sample section (3), or the container body, which is attached to the container holding section (2), has a protruded section (10) which can communicate with an inlet (11) for a thin film (5) and the inside of the container, places the thin-film sample (5) to be subjected to X-ray diffraction measurement, and performs the incidence/emission of X-rays; and a lid section (9) which functions as a valve capable of cutoff/communication between a path, for introducing gas from the outside to the inside of the container and discharging the inside of the container, and the sample section (3), and is detachable from/to the protruded section (10). Closing and opening of the valve in the lid section (9) attached to the protruded section (10) performs the ventilation/sealing between the inside and the outside of the container to control the environments within the container. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005043285(A) 申请公布日期 2005.02.17
申请号 JP20030279342 申请日期 2003.07.24
申请人 JAPAN SCIENCE & TECHNOLOGY AGENCY 发明人 INOUE HARUO;TANAMURA YOSHIHIKO;SASAMOTO SHIN;KATAOKA TADATAKA
分类号 G01N23/20;G01N21/33;(IPC1-7):G01N23/20 主分类号 G01N23/20
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