| 摘要 |
PROBLEM TO BE SOLVED: To shorten the time for adjustment and to permit adjustment having reproducibility by systematizing an exposure spot diameter of a laser beam to a resist layer in an exposing device for a master disk of an optical disk. SOLUTION: A stage 21 for exposure spot adjustment to be placed on with the disk for exposure spot adjustment previously formed with grooves is disposed in a position adjacent to the master disk 19 of the optical disk and the disk for the exposure spot adjustment on the stage 21 is irradiated with the laser beeam. The laser beam reflected by the grooves is read by a photodetector 17. The disk for exposure spot adjustment is moved in this state in a diametral direction by a sliding mechanism 36. The peak value of an amplitude level is detected from the detection signal of the photodetector 17 obtained by accompanying the movement thereof. As the sliding mechanism 36 moves, a lens 4 of, for example, an optical system for exposure is moved in order to change the exposure spot diameter and the position of the lens 4 at the time of the maximum amplitude of the peak detection signal is stored. The position of the lens 4 is moved and controlled in such a manner the lens attains the optimum state of the exposure spot diameter. COPYRIGHT: (C)2005,JPO&NCIPI
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