发明名称 Deposition apparatus and manufacturing apparatus
摘要 An object of the present invention is to carry out stable film deposition for a long stretch of time without an evaporation material being stuck in a manufacturing apparatus that carries out evaporation. A driving portion that can move a crucible up and down is provided for an evaporation source of an evaporation apparatus. When the opening of the crucible is clogged with the evaporation material, the crucible is moved down and sealed in the evaporation source. The heater of the evaporation source can heat the opening efficiently; therefore, the evaporation material with which the opening is filled is evaporated; therefore, the blockage can be dissolved. Thereafter, the crucible is moved above and heated to carry out evaporation. It is possible to carry out film deposition without exposure to the atmosphere for a long stretch of time, which can improve the productivity of an organic EL element.
申请公布号 US2005034671(A1) 申请公布日期 2005.02.17
申请号 US20040911519 申请日期 2004.08.05
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 OHARA HIROKI
分类号 C23C14/12;C23C14/24;C23C14/26;C23C16/00;H05B33/10;(IPC1-7):C23C16/00 主分类号 C23C14/12
代理机构 代理人
主权项
地址