发明名称 |
MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM, AND METHOD FOR INTRODUCING AN IMMERSION LIQUID INTO AN IMMERSION CHAMBER |
摘要 |
The invention relates to a projection exposure system for microlithography, said system comprising an illumination device for generating a projection light, and a projection objective comprising a plurality of optical elements such as lenses (L5) and enabling a reticle that can be arranged in an object plane of the projection objective to be imaged onto a light-sensitive surface (26) that can be arranged in an image plane of the projection objective and is applied to a carrier (30). The inventive system is also provided with an immersion device between an image-side last optical element (L5) of the projection objective and the light-sensitive surface (26), for introducing an immersion liquid (34) into an immersion chamber (50). Said immersion device comprises means (44; 66) which can prevent the appearance of gas bubbles (48) in the immersion liquid (34), affecting the imaging quality, and/or can remove existing gas bubbles (48). Said means can be, for example, an ultrasound source (66) or a degasifier (44). |
申请公布号 |
WO2005015315(A2) |
申请公布日期 |
2005.02.17 |
申请号 |
WO2004EP07456 |
申请日期 |
2004.07.08 |
申请人 |
CARL ZEISS SMT AG;GELLRICH, BERNHARD;REISINGER, GERD;SCHMEREK, DIETER;KUGLER, JENS |
发明人 |
GELLRICH, BERNHARD;REISINGER, GERD;SCHMEREK, DIETER;KUGLER, JENS |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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