METHOD OF CLEANING AND METHOD OF PREPARING CLEANING WATER

摘要

PROBLEM TO BE SOLVED: To provide a method of cleaning which removes foreign matters efficiently without damaging the fine ULSI patterns formed on a semiconductor-device substrate even if an ultrasonic wave is used, and a method of preparing the cleaning water. SOLUTION: The cleaning is carried out using gas-dissolved water containing a gas at super-saturating concentration and with a plenty of gas bubbles as the cleaning water in which ultrasonic vibration is propagated. The plenty of gas bubbles relaxes ultrasonic power to prevent pattern damage. As for the cleaning capability, the micro-bubble effect and the lift-off effect are promoted, and ultrasonic cleaning having high foreign-matter removing capability can be carried out. COPYRIGHT: (C)2005,JPO&NCIPI