| 发明名称 |
Semiconductor processing system and method |
| 摘要 |
Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.
|
| 申请公布号 |
US2005037597(A1) |
申请公布日期 |
2005.02.17 |
| 申请号 |
US20030403211 |
申请日期 |
2003.04.01 |
| 申请人 |
NGUYEN TUE;NGUYEN TAI DUNG;BERCAW CRAIG ALAN |
发明人 |
NGUYEN TUE;NGUYEN TAI DUNG;BERCAW CRAIG ALAN |
| 分类号 |
C23C16/44;C23C16/455;C23C16/48;C23C16/515;H01L21/00;(IPC1-7):H01L21/20 |
主分类号 |
C23C16/44 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
