发明名称 |
Mask, exposure method, line width measuring method, and method for manufacturing semiconductor devices |
摘要 |
A mask of the present invention has a circuit pattern to be transferred to a substrate via an optical system, and an inspection pattern to be used for a measurement of a line width of the pattern transferred to the substrate. By using such a mask, the time for proceeding from inspection to actual device exposure can be shortened. |
申请公布号 |
US6855997(B2) |
申请公布日期 |
2005.02.15 |
申请号 |
US20000729339 |
申请日期 |
2000.12.05 |
申请人 |
NIKON CORPORATION |
发明人 |
SUWA KYOICHI |
分类号 |
H01L21/027;G03F1/00;G03F1/08;G03F1/14;G03F1/38;G03F1/44;G03F7/20;H01L21/66;H01L23/544;(IPC1-7):H01L31/023 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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