发明名称 |
Installation and method for vacuum treatment or powder production |
摘要 |
Vacuum treatment installation with a vacuum treatment chamber containing a plasma discharge configuration as well as a gas supply configuration. The plasma discharge configuration has at least two plasma beam discharge configurations with substantially parallel discharge axes and a deposition configuration is positioned along a surface which extends at predetermined distances from the beam axes and along a substantial section of the longitudinal extent of the discharge beam.
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申请公布号 |
US2005028737(A1) |
申请公布日期 |
2005.02.10 |
申请号 |
US20040759611 |
申请日期 |
2004.01.16 |
申请人 |
UNAXIS BALZERS AKTIENGESELLSCHAFT |
发明人 |
KARNER JOHANN;PEDRAZZINI MAURO |
分类号 |
C23C16/50;C23C16/44;C23C16/513;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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