发明名称 |
Excimer or molecular fluorine laser system with precision timing |
摘要 |
A Master Oscillator (MO)-Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirements of advanced lithography scanner systems. The timing of discharges in discharge chambers of the MO and PA can be precisely controlled using a common pulser to drive the respective chambers. The timing of the discharges further can be controlled through the timing of the pre-ionization in the chambers, or through control of the reset current in the final compression stages of the pulser. A common pulser, or separate pulser circuits, also can be actively controlled in time using a feedback loop, with precision timing being achieved through control of the pre-ionization in each individual discharge chamber. Yet another system provides for real-time compensation of time delay jitter of discharge pulses in the chambers.
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申请公布号 |
US2005031004(A1) |
申请公布日期 |
2005.02.10 |
申请号 |
US20030699763 |
申请日期 |
2003.11.03 |
申请人 |
BASTING DIRK;GOVORKOV SERGEI;PAETZEL RAINER;BRAGIN IGOR;TARGSDORF ANDREAS |
发明人 |
BASTING DIRK;GOVORKOV SERGEI;PAETZEL RAINER;BRAGIN IGOR;TARGSDORF ANDREAS |
分类号 |
H01S3/00;H01S3/0971;H01S3/22;H01S3/225;H01S3/23;(IPC1-7):H01S3/22 |
主分类号 |
H01S3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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