Lithographic apparatus and device manufacturing method
摘要
A reaction mass 14; 54; 64 and an actuator 15; 55; 65 are used to reduce unwanted vibrations of an optical element 10; 50; 60 in the projection system of a lithographic projection apparatus. The reaction mass 14; 54; 64 may be mechanically connected only to the optical element 50; 60 or may be compliantly mounted to the projection system frame 11. <IMAGE>
申请公布号
EP1321823(A3)
申请公布日期
2005.02.09
申请号
EP20020258763
申请日期
2002.12.19
申请人
ASML NETHERLANDS B.V.
发明人
COX, HENDRIKUS HERMAN MARIE;AUER, FRANK;VAN DER WIJST, MARC WILHELMUS MARIA;JANSEN, BASTIAAN STEPHANUS HENDRIKUS;FRANKEN, DOMINICUS JACOBUS PETRUS ADRIANUS