发明名称 POSITIVE RADIATION-SENSITIVE POLYMER COMPOSITION, THIN FILM USING THE COMPOSITION AND ELEMENT USING THE THIN FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive radiation-sensitive polymer composition developable with an aqueous alkali solution, having high sensitivity and high resolution, and capable of forming a pattern-like thin film excellent in flatness, heat and solvent resistances and transparency. <P>SOLUTION: This positive radiation-sensitive polymer composition comprises a vinyl polymer having at least one of the constitutional units represented by formula (1) and a 1,2-quinonediazido compound, wherein R<SP>1</SP>is a single bond or a 1-3C alkylene; R<SP>2</SP>is H, methyl or Cl; R<SP>3</SP>is H or a 1-3C alkyl; X is -COO-, -OCO-, -O- or -S-; and A is an oxetane group represented by formula (a) or formula (b) wherein R<SP>4</SP>and R<SP>5</SP>are each a single bond or a 1-3C alkylene; and R<SP>6</SP>-R<SP>15</SP>are each H or a 1-3C alkyl. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005031642(A) 申请公布日期 2005.02.03
申请号 JP20040170729 申请日期 2004.06.09
申请人 CHISSO CORP 发明人 MITANI SEIJU;MOMOSE KEIICHI;SATO HIROYUKI;YAMAHIRO MIKIO
分类号 G03F7/023;C08F12/22;G03F7/004;G03F7/033;H01L21/027 主分类号 G03F7/023
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