发明名称 |
MANUFACTURING METHOD OF COMPOUND SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a compound semiconductor device that has high active strength and high setting accuracy of an oscillating wavelength. SOLUTION: This is a manufacturing method for a compound semiconductor device that has a detection step of irradiating an energy wave to a first semiconductor layer of a group III-V compound composed of one or more group III elements and two or more group V elements including at least hydrogen to detect a first crystallization state of the first semiconductor layer, and an annealing step of annealing the first semiconductor layer having the first crystallization state to modify it to a second semiconductor layer having a second crystallization state. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005033188(A) |
申请公布日期 |
2005.02.03 |
申请号 |
JP20040170081 |
申请日期 |
2004.06.08 |
申请人 |
SHARP CORP |
发明人 |
KAWASAKI OSAMU;TOMOMURA YOSHITAKA |
分类号 |
H01S5/343;(IPC1-7):H01S5/343 |
主分类号 |
H01S5/343 |
代理机构 |
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代理人 |
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