发明名称 MANUFACTURING METHOD OF COMPOUND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method for a compound semiconductor device that has high active strength and high setting accuracy of an oscillating wavelength. SOLUTION: This is a manufacturing method for a compound semiconductor device that has a detection step of irradiating an energy wave to a first semiconductor layer of a group III-V compound composed of one or more group III elements and two or more group V elements including at least hydrogen to detect a first crystallization state of the first semiconductor layer, and an annealing step of annealing the first semiconductor layer having the first crystallization state to modify it to a second semiconductor layer having a second crystallization state. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005033188(A) 申请公布日期 2005.02.03
申请号 JP20040170081 申请日期 2004.06.08
申请人 SHARP CORP 发明人 KAWASAKI OSAMU;TOMOMURA YOSHITAKA
分类号 H01S5/343;(IPC1-7):H01S5/343 主分类号 H01S5/343
代理机构 代理人
主权项
地址