发明名称 |
METHOD AND SYSTEM FOR ION BEAM CONTAINMENT USING PHOTOELECTRONS IN AN ION BEAM GUIDE |
摘要 |
Ion implantation systems and beam containment apparatus therefor are provided in which a photoelectron source and a photon source are provided along a beam path. The photon source, such as a UV lamp, provides photons to a photoemissive material of the photoelectron source to generate photoelectrons for enhanced beam containment in the ion implantation system.
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申请公布号 |
US2005023487(A1) |
申请公布日期 |
2005.02.03 |
申请号 |
US20030632234 |
申请日期 |
2003.07.31 |
申请人 |
WENZEL KEVIN W.;VANDERBERG BO H. |
发明人 |
WENZEL KEVIN W.;VANDERBERG BO H. |
分类号 |
G21K1/14;H01J37/02;H01J37/317;(IPC1-7):H01J37/317 |
主分类号 |
G21K1/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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