发明名称 Elementary analysis device by optical emission spectrometry on laser produced plasma
摘要 This device comprises a pulsed laser source (6), means (8, 10, 12) for focusing light from this source onto an object to be analysed (2) to produce plasma on the surface of the object, means (16, 18) of analysing a plasma radiation spectrum, means (20) of determining the elementary composition of the object from this analysis, and possibly means (4) for displacing the object. The invention is particularly applicable to test radioactive materials.
申请公布号 US2005024638(A1) 申请公布日期 2005.02.03
申请号 US20040932829 申请日期 2004.09.01
申请人 LACOUR JEAN-LUC;WAGNER JEAN-FRANCOIS;DETALLE VINCENT;MAUCHIEN PATRICK 发明人 LACOUR JEAN-LUC;WAGNER JEAN-FRANCOIS;DETALLE VINCENT;MAUCHIEN PATRICK
分类号 G01N21/63;G01N21/71;(IPC1-7):G01J3/30 主分类号 G01N21/63
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