发明名称 |
Monitoring substrate processing by detecting reflectively diffracted light |
摘要 |
A substrate is placed in a process zone and an energized process gas is maintained in the process zone to process the substrate. A light beam is reflectively diffracted from a pattern of features of the substrate being processed, the reflected beam is monitored, and a signal is generated in relation to the monitored beam. During processing, a width of the features of the substrate can change. The generated signal is evaluated to detect the occurrence of a change in the width of the features.
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申请公布号 |
US6849151(B2) |
申请公布日期 |
2005.02.01 |
申请号 |
US20020215065 |
申请日期 |
2002.08.07 |
申请人 |
BARNES MICHAEL S.;HOLLAND JOHN P.;MUI DAVID S. L.;LIU WEI |
发明人 |
BARNES MICHAEL S.;HOLLAND JOHN P.;MUI DAVID S. L.;LIU WEI |
分类号 |
C23C14/54;C23C16/52;G01N21/47;G01N21/95;G01N21/956;H01J37/32;(IPC1-7):H05H1/00;C23C16/00;H01L21/00 |
主分类号 |
C23C14/54 |
代理机构 |
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代理人 |
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