发明名称 Process liquid supply mechanism and process liquid supply method
摘要 A process liquid supply mechanism for supplying a process liquid comprises a process liquid supply source for supplying a process liquid, a process liquid discharging nozzle for discharging the process liquid, a pipe connecting the process liquid supply source to the process liquid discharging nozzle, a pump mounted to the pipe for allowing the process liquid to be discharged from the process liquid discharging nozzle, a pressure sensor for detecting the pressure of the process liquid at a prescribed position intermediate between the pump and the process liquid discharging nozzle, and a controller for controlling the inner pressure of the pump based on the pressure value detected by the pressure sensor and the relationship obtained in advance between the pressure and the discharging rate of the process liquid such that the process liquid is discharged at a prescribed discharging rate.
申请公布号 US6848625(B2) 申请公布日期 2005.02.01
申请号 US20030388357 申请日期 2003.03.14
申请人 TOKYO ELECTRON LIMITED 发明人 TAKEKUMA TAKASHI;FURUSHO TOSHINOBU;OHTO TAKESHI;MIYAMOTO HIROYUKI;YOSHIHARA KOUSUKE;HORI SHINYA;HARA HIROYUKI
分类号 H01L21/00;(IPC1-7):B05B17/00 主分类号 H01L21/00
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