Target arrangement for sputtering processes comprises a cylindrical support element and a hollow cylindrical target made from target material
摘要
<p>Target arrangement (10) comprises a cylindrical support element (12) and a hollow cylindrical target (22) made from target material. The target surrounding the support element in sections is held at a distance to the support element by a clamping ring (20) arranged between the support element and the target and is fixed by the clamping ring to the support element using a clamping seat.</p>
