发明名称 PLASMA TREATING APPARATUS AND ITS ELECTRODE STRUCTURE
摘要 [PROBLEMS] To provide a plasma treating apparatus for an object with a large area, wherein the amount of deflection due to the Coulomb force of the electrode is reduced and the uniformness of the surface treatment is ensured. [MEANS FOR SOLVING PROBLEMS] An electrode structure (30X) of a plasma treating apparatus comprises a pair of electrode rows (31X, 32X) facing to each other in the back and forth direction and each extending in the left and right direction. Each electrode row is composed of electrode members (31A to 32C) arranged in the left and right direction. The electrode members of one electrode row and those of the other are so disposed in substantially the same positions in the left and right directions. Each of the electrode members of one electrode row has a polarity opposite to that of the respective opposed electrode member of the other. Between the opposed surfaces of the electrode members of the electrode rows, a row-to-row gap (33p) is defined. Any two adjacent electrode members of each electrode row have polarities opposite to each other.
申请公布号 WO2005009090(A1) 申请公布日期 2005.01.27
申请号 WO2004JP10415 申请日期 2004.07.22
申请人 SEKISUI CHEMICAL CO., LTD.;UEHARA, TSUYOSHI;ONO, TAKAYUKI;SEZUKURI, HITOSHI;TAKEUCHI, HIROTO;KOMIYA, HIROMI;ITO, TAKUMI;OHTA, TAKAE 发明人 UEHARA, TSUYOSHI;ONO, TAKAYUKI;SEZUKURI, HITOSHI;TAKEUCHI, HIROTO;KOMIYA, HIROMI;ITO, TAKUMI;OHTA, TAKAE
分类号 H01J37/32 主分类号 H01J37/32
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