发明名称 BASE MATERIAL FOR PLATING
摘要 PROBLEM TO BE SOLVED: To provide a base material for plating whose adhesion to a plating material can suitably be regulated in accordance with use, and, particularly suitable to use for electronic components in the fields of a semiconductor and a printed circuit board. SOLUTION: In the base material for plating in which a dry film formed layer is formed on the surface of a metal base material with a ten-point mean roughness Rz of≤3.5μm, the arithmetic mean roughness Ra in the micro-region of 2μm×2μm in the dry film formed layer is controlled to 17 to 100 nm. Preferably, at least the surface layer of the dry film formed layer has a columnar structure grown in a direction of≥15 degrees to the direction vertical to the surface of the metal base material. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005023384(A) 申请公布日期 2005.01.27
申请号 JP20030191208 申请日期 2003.07.03
申请人 HITACHI METALS LTD 发明人 MINE YOJI;TAKASHIMA HIROSHI;KAWAI TETSUO
分类号 C23C14/34;C23C14/16;(IPC1-7):C23C14/34 主分类号 C23C14/34
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