发明名称 STAGE APPARATUS AND CHARGED PARTICLE BEAM EXPOSURE DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a stage apparatus, etc. which can reduce a disturbance magnetic field arising due to generation of eddy current in association with a drive of a linear motor. SOLUTION: The stage apparatus 10 includes the linear motor in which S poles and N poles are arranged oppositely via a stage 25 in an X direction so that polarity of a magnet 30 becomes inverse. Thus, when the linear motor is driven (when control current is applied), a magnetic fluxΦ1 directed toward the upper surface of the stage 25 and a magnetic fluxΦ2 directed toward the lower surface of the stage 25 operate so as to cancel each other. Since a heat pipe 41 has an insulator 41a which interrupts an electric insulation in a driving direction of the linear motor, the eddy current generated in association with the drive of the linear motor can make it hard to flow in the heat pipe 41. Therefore, the disturbance of the orbit of an electron beam due to a magnetic field change is reduced, and the deterioration of the drawing accuracy of a wafer laid on the stage 25 can be reduced as well. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005026329(A) 申请公布日期 2005.01.27
申请号 JP20030187904 申请日期 2003.06.30
申请人 NIKON CORP 发明人 TAKEKOSHI HIDEKAZU
分类号 H01L21/68;H01L21/027;H02K41/03;(IPC1-7):H01L21/027 主分类号 H01L21/68
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