| 发明名称 |
Plasma sprayed indium tin oxide target for sputtering |
| 摘要 |
A method for forming a target for sputtering is provided. The method includes providing a metal target backing. A surface of the provided metal target backing is metalized. A sputtering donor material is plasma sprayed on the metalized metal target backing.
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| 申请公布号 |
US2005016833(A1) |
申请公布日期 |
2005.01.27 |
| 申请号 |
US20040827606 |
申请日期 |
2004.04.19 |
| 申请人 |
LYNN SHANNON |
发明人 |
LYNN SHANNON |
| 分类号 |
C23C14/34;(IPC1-7):C23C14/32 |
主分类号 |
C23C14/34 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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