发明名称 |
Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
摘要 |
A lithographic projection apparatus includes a support configured to support a patterning device, the patterning device configure to pattern the projection beam according to a desired patter. The apparatus has a substrate table configure to hold a substrate, a projection system configured to project the patterned beam onto a target portion of the substrate. The apparatus also has a purge gas supply system configured to provide a purge gas near a surface of a component of the lithographic projection apparatus. The purge gas supply system includes a purge gas mixture generator configured to generate a purge gas mixture which includes at least one purging gas and a moisture. The purge gas mixture generator has a moisturizer configured to add the moisture to the purge gas and a purge gas mixture outlet connected to the purge gas mixture generator configured to supply the purge gas mixture near the surface.
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申请公布号 |
US2005017198(A1) |
申请公布日期 |
2005.01.27 |
申请号 |
US20030623180 |
申请日期 |
2003.07.21 |
申请人 |
ASML NETHERLANDS B.V.;AERONEX, INC. |
发明人 |
VAN DER NET ANTONIUS JOHANNES;SPIEGELMAN JEFFREY J.;VAN BRAGT JOHANNUS JOSEPHUS |
分类号 |
G02B27/00;G03F7/20;(IPC1-7):G21G5/00 |
主分类号 |
G02B27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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