| 发明名称 |
POSITIVE PHOTORESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN |
| 摘要 |
<p>A positive photoresist composition comprising an alkali-soluble novolak resin (A) containing a structural unit (al) represented by a general formula (I) shown below, and a structural unit (a2) represented by a general formula (II) shown below, and a photosensitizer (B).</p> |
| 申请公布号 |
WO2005007718(A1) |
申请公布日期 |
2005.01.27 |
| 申请号 |
WO2004JP10434 |
申请日期 |
2004.07.15 |
| 申请人 |
TOKYO OHKA KOGYO CO., LTD.;MASUDA, YASUO;OKUI, TOSHIKI |
发明人 |
MASUDA, YASUO;OKUI, TOSHIKI |
| 分类号 |
H01L21/027;C08G8/10;C08L61/06;G03F7/023;(IPC1-7):C08G8/00;C08G14/00 |
主分类号 |
H01L21/027 |
| 代理机构 |
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代理人 |
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| 主权项 |
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